Process Control & APC
Control Strategies
Continuous Control
The easy object oriented, explorer-based, drag and drop configuration allows you to build complex process functions. Faceplates associated with every instruction help you set-up, tune and control the element with a minimum of effort. Additions and modifications can be performed online, while your process keeps running. Furthermore, the software allows you to mix and match IEC61131-3 compliant programming languages. All supported programming languages share the same development environment, tag database and user interface, resulting in reduced training and higher productivity.
Batch Control
We embed a state machine in the controllers. This follows the ISA-88.01 phase state model for batch control and PackML machine control model. It also provides a framework for entering phase state logic. For simple batch procedures, phase state transitions are managed by the controller. In addition, it's designed to provide tight integration with batch management software.
Advanced Process Control
The platform provides you with four optional function blocks for advanced regulatory control. These help control applications with multiple interacting inputs/outputs or with long dead times. This control capability includes:
- Internal model control
- Coordinated (1 x 3) control
- Multivariable (2 x 3) control
- Fuzzy logic
Fuzzy Logic & More
Our fuzzy logic allows you to create custom algorithms for use in our controllers. It also contains tools to allow optimization of your process. This advanced regulatory control is ideal for loop tuning and optimization at the device and loop levels.
A key addition to the advanced control suite of offerings is process optimization capability from Pavilion Technologies, a Rockwell Automation company. This features inferential measurements, supervisory control and real-time optimization technologies including:
- Model Predictive Control
- Dynamic Simulation and Modeling
- Neural Network Technology
- Sustainability and Environmental Compliance
- Uses a reference model of the process to analyze the current process behavior and to predict future process behavior
- Allows the controller to determine the best way to adjust the process input variables to drive process output variables to their optimum targets
These Supervisory Control and Real-time Optimization controls optimize major process unit(s) as a system, rather than optimizing loops independently. Combining Rockwell Automation's unparalleled Logix platform and control software (Advanced Regulatory Control) with Pavilion's proven MPC applications (Inferential Measurements, Supervisory Control and Real-time Optimization) provide the most innovative and value added manufacturing optimization package in the industry.